首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Microstructures, mechanical and tribological properties of NbN/MoS2 nanomultilayered films deposited by reactive magnetron sputtering
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Microstructures, mechanical and tribological properties of NbN/MoS2 nanomultilayered films deposited by reactive magnetron sputtering

机译:反应磁控溅射沉积NBN / MOS2纳米型薄膜的微观结构,机械和摩擦学性能

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摘要

The NbN/MoS2 nanomultilayered films with different thickness of MoS2 were synthesized by reactive magnetron sputtering. The influences of MoS2 thickness on microstructures, mechanical and tribological properties were investigated by X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), scanning electron microscope (SEM) and nano-indentation techniques. The results indicate that the NbN/MoS2 nanomultilayered films are composed of NbN phase with (111) preferred orientation. As the thickness of MoS2 layer increases, the crystallinity of NbN phase initially improves and then deteriorates, and the hardness and elastic modulus first increases and then decreases. When the thickness of MoS2 layer is 0.8 nm, the hexagonal-structured MoS2 layers transform to B1-NaCl structure under the template effect of NbN layers and grow epitaxially with NbN layers, resulting in enhancement of hardness and elastic modulus. The maximum hardness and elastic modulus reach 30.4 GPa and 431 GPa, respectively, which are remarkably higher than those (22.8 GPa and 354 GPa) of NbN monolithic film deposited under the same conditions. The friction coefficient of NbN/MoS2 nanomultilayered films are in a range of 0.20-0.30, much lower than that of the monolithic NbN film.
机译:通过反应磁控溅射合成具有不同厚度MOS2的NBN / MOS2纳米型薄膜。通过X射线衍射(XRD),高分辨率透射电子显微镜(HRTEM),扫描电子显微镜(SEM)和纳米压痕技术研究MOS2厚度对微结构,机械和摩擦学性质的影响。结果表明,NBN / MOS2纳米型膜由NBN相由(111)优选取向组成。随着MOS2层的厚度增加,NBN相的结晶度最初改善,然后劣化,并且硬度和弹性模量首先增加然后减少。当MOS2层的厚度为0.8nm时,六边形结构的MOS2层在NBN层的模板效果下转化为B1-NaCl结构,并与NBN层外延生长,导致硬度和弹性模量的增强。最大硬度和弹性模量分别达到30.4GPa和431GPa,其显着高于在相同条件下沉积的NBN单片膜的(22.8GPa和354GPa)。 NBN / MOS2纳米型薄膜的摩擦系数在0.20-0.30的范围内,远低于整体NBN膜的薄膜。

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