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Physicochemical, structural, mechanical, and tribological characteristics of Si3N4–MoS2 thin films deposited by reactive magnetron sputtering

机译：反应磁控溅射沉积Si3N4–MoS2薄膜的物理化学，结构，力学和摩擦学特性

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Trentin Ronaldo E.; Bandeira Aline L.; Cemin Felipe; Morales Mónica; Amorim Cintia L.G.; Aguzzoli César; Alvarez Fernando; Baumvol Israel J.R.; Farias M.C.M.; Figueroa Carlos A.;
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1. Physicochemical, structural, mechanical, and tribological characteristics of Si_3N_4-MoS_2 thin films deposited by reactive magnetron sputtering [J] . Ronaldo E. Trentin, Aline L. Bandeira, FelipeCemin, Surface & Coatings Technology . 2014,第Null期

机译：反应磁控溅射沉积Si_3N_4-MoS_2薄膜的物理化学，结构，力学和摩擦学特性
2. Microstructures, mechanical and tribological properties of NbN/MoS2 nanomultilayered films deposited by reactive magnetron sputtering [J] . Zhang Ergeng, Liu Jingling, Li Wei Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2019,第期

机译：反应磁控溅射沉积NBN / MOS2纳米型薄膜的微观结构，机械和摩擦学性能
3. Physicochemical and structural characteristics of TiC and VC thin films deposited by DC reactive magnetron sputtering [J] . C. Aguzzoli, C. A. Figueroa, G. V. Soares, Journal of Materials Science . 2010,第18期

机译：直流反应磁控溅射沉积TiC和VC薄膜的理化和结构特征
4. Effect of Film Thickness on Structural and Mechanical Properties of AlCrN Nanocompoite Thin Films Deposited by Reactive DC Magnetron Sputtering. [C] . Ravi Prakash, Davinder Kaur International Conference on Condensed Matter and Applied Physics . 2016

机译：膜厚度对反应性DC磁控溅射沉积的Alcrn纳米组合薄膜结构和力学性能的影响。
5. Aluminium nitride piezoelectric thin films reactively deposited in closed field unbalanced magnetron sputtering for elevated temperature 'smart' tribological applications. [D] . Hasheminiasari, Masood. 2013

机译：在高温“智能”摩擦应用中，在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
6. HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering [O] . A. Faudoa-Arzate, A. Arteaga-Durán, R.J. Saenz-Hernández, 2017

机译：反应性射频磁控溅射沉积β-WO3薄膜的HRTEM显微结构表征
7. Análisis estructural, superficial y tribológico de recubrimientos de nitruro de cromo (CrN) sintetizado por magnetrón sputtering reactivo DC = Structural, surface and tribological analyzed of CrN thin films by reactive magnetron sputtering DC [O] . Ruden Muñoz Alexander 2011

机译：反应溅射磁控管DC合成氮化铬（CrN）涂层的结构，表面和摩擦学分析DC =反应磁控溅射DC对CrN薄膜的结构，表面和摩擦学分析

Physicochemical, structural, mechanical, and tribological characteristics of Si3N4–MoS2 thin films deposited by reactive magnetron sputtering

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