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Structure and Dielectric Properties of Zn Doped PST Thin Films Prepared by Sol-Gel Method

机译:溶胶 - 凝胶法制备Zn掺杂PST薄膜的结构和介电性能

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(Pb_ySr_(1-y))Zn_xTi_(1-x)O_(3-x) thin films were prepared on ITO/glass substrate by sol-gel process using dip-coating method. The phase structure, morphology, and dielectric properties of thin films were investigated by XRD, SEM and impedance analyzer, respectively. The perovskite phase structure was exhibited in the Zn-doped PST thin films. The formation ability of the thin films of the perovskite phase and its grain size decreased with the increase in doping Zn. The dielectric constant of the thin film was influenced by oxygen vacancies which could be controlled by Zn doping.
机译:(使用浸涂法通过溶胶 - 凝胶工艺在ITO /玻璃基板上制备Zn_Xy_(1-y))Zn_XTI_(1-X)O_(3-X)薄膜。通过XRD,SEM和阻抗分析仪研究了薄膜的相结构,形态和介电性质。在Zn掺杂的PST薄膜中表现出钙钛矿相结构。钙钛矿相的薄膜的形成能力及其粒度随着掺杂锌的增加而降低。薄膜的介电常数受到氧空位的影响,氧空位可以通过Zn掺杂来控制。

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