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Modeling the mechanical behavior of polycrystalline interconnect lines

机译:建模多晶互连线的力学行为

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摘要

An approach for modeling thin polycrystalline films on substrates,centered at the grain scale in order to model local heterogeneities that may lead to failure,is the focus of this work.Heterogeneous stresses and possible subsequent failure mechanisms that arise due to thermal conditions and electromigration are considered.The mechanical behavior is modeled including dislocation motion and interactions,and both stress and electromigration driven diffusion processes.
机译:一种用于在底板上进行薄多晶膜的方法,以晶粒刻度为中心,以模拟可能导致故障的局部异质性,是这项工作的重点。对于该工作的重点是由于热条件和电迁移而产生的可能随后的失效机制考虑。建模的机械行为包括位错运动和相互作用,以及应力和电迁移驱动的扩散过程。

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