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Highly luminescent cubic GaN microcrystals grown on GaAs(001) substrates by RF-MBE

机译:通过RF-MBE在GaAs(001)基材上生长的高度发光立方GaN微晶

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Cubic GaN microcrystals have been grown on a cubic GaN template by radio-frequency plasma molecular beam epitaxy (RF-MBE) using a relatively thin low-temperature-grown GaN buffer layer, which promotes the generation of Ga droplets acting as the nuclei for three-dimensional (3D) growth. These crystals are found to be highly luminescent compared to those grown by metalorganic vapour-phase epitaxy (MOVPE). Their optical quality is much better than that of the two-dimensionally (2D) growth c-GaN region as investigated by microcathodoluminescence (micro-CL) and photoluminescence (PL). These results suggest that defects or local strain, originating from the large lattice mismatch and thermal mismatch between GaN and GaAs, could be avoided by the transition from 2D to 3D growth mode with the use of this nucleation process.
机译:使用相对薄的低温生长的GaN缓冲层的射频等离子体分子束外延(RF-MBE)在立方GaN模板上生长在立方GaN模板上,其促进了作用作为核的GA液滴的产生 - 增长(3D)增长。与由金属机气相外延(MOVPE)生长的那些相比,发现这些晶体是高发光的。它们的光学质量远优于由微致发光(Micro-Cl)和光致发光(PL)研究的二维(2D)生长C-GaN区域的光学质量。这些结果表明,通过使用这种成核过程,可以避免从2D到3D生长模式的过渡到GaN和GaAs之间的缺陷或局部应变,源自GaN和GaAs之间的大格和GaAs之间的热不匹配。

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