首页> 外文会议>日本機械学会年次大会 >Preparation of Ti-DLC Films by Plasma Spraying CVD Method and its Mechanical Property
【24h】

Preparation of Ti-DLC Films by Plasma Spraying CVD Method and its Mechanical Property

机译:等离子体喷涂CVD法制备Ti-DLC膜及其机械性能

获取原文

摘要

Diamond-Like Carbon films are increasing their application fields due to the outstanding wear-resistant properties. This study presents fabrication of nano-structured Ti-DLC films using arc-glow hybrid plasma. A deposition apparatus consists of a DC plasma torch, a substrate holder and a vacuum chamber. An orifice of 10mm diameter mounted at the exit of the torch can generate appropriate pressure difference between the torch and the chamber. Ti particles are sprayed onto the substrate with plasma jet. RF power supply is connected to the substrate holder to generate a glow discharge plasma, and DLC films are prepared by RF plasma CVD at the same time. The hardness of the deposited film increased from 13 to 30GPa with decreasing the Ti content in the film from 0 to 30 vol.%. The thickness of the films was approximately 6μm in 30 min deposition These results lead to the conclusion that thick Ti-DLC film can be fabricated at high growth rate by the arc-glow hybrid plasma CVD.
机译:由于出色的耐磨性,菱形碳膜正在增加其施用领域。本研究介绍了使用弧形杂交等离子体的纳米结构Ti-DLC膜的制造。沉积设备由DC等离子体焊炬,基板支架和真空室组成。安装在焊炬的出口处的10mm直径的孔可以在焊炬和腔室之间产生适当的压力差。用等离子体射流将Ti颗粒喷涂到基板上。 RF电源连接到基板保持器以产生辉光放电等离子体,并且通过RF等离子体CVD同时制备DLC膜。沉积膜的硬度从13-30GPa增加,随着薄膜中的Ti含量从0到30体积减少。%。 30分钟沉积膜的厚度约为6μm这些结果导致厚Ti-DLC膜可以通过弧形杂交等离子体CVD在高生长速率下制造。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号