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Study of the yielding and strain hardening behavior of a copper thin film on a silicon substrate using microbeam bending

机译:使用微沟弯曲的硅衬底上铜薄膜的屈服和应变硬化行为研究

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Recently a new microbeam bending technique utilizing triangular beams was introduced. For this geometry, the film on top of the beam deforms uniformly when the beams are deflected, unlike the standard rectangular geometry in which the bending is concentrated at the support. The yielding behavior of the film can be modeled using average stress-strain equations to predict the stress-strain relation for the film while attached to its substrate. This model has also been used to show that the gradient of stress and strain through the thickness of the film, which occurs during beam bending, does not obscure the measurement of the yield stress in our analysis. Utilizing this technique, the yielding and strain hardening behavior of bare Cu thin films has been investigated. The Cu film was thermally cycled from room temperature to 500 °C, and from room temperature to -196 °C. The film was tested after each cycle. The thermal cycles were performed to examine the effect of thermal processing on the stress-strain behavior of the film.
机译:最近,介绍了一种利用三角梁的新微沟弯曲技术。对于该几何形状,当梁偏转时,梁顶部的膜均匀地变形,与标准矩形几何形状不同,其中弯曲浓缩在支撑件处。可以使用平均应力 - 应变方程式建模膜的产生行为,以预测连接到其基材的同时对膜的应力应变关系。该模型还被用来表明应力和应变通过薄膜厚度的厚度,这在梁弯曲期间发生的薄膜不会掩盖我们分析中产量应力的测量。利用该技术,研究了裸CU薄膜的产量和应变硬化行为。将Cu膜从室温热循环至500℃,从室温到-196℃。每个循环后测试薄膜。进行热循环以检查热处理对膜的应力 - 应变行为的影响。

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