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Probing the properties of self-organized InGaAs quantum dots on GaAs (311)B and (001) by conductive atomic force microscope tip

机译:通过导电原子力显微镜尖端探测GaAs(311)B和(001)的自组织IngaAs量子点的性质

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We have used conductive atomic force microscope (AFM) tips to study the electronic properties of self-organized InGaAs quantum dots (QDs) grown on GaAs (311)B substrate by atomic H-assisted molecular beam epitaxy. As shown previously, InGaAs QDs on GaAs (311)B surface exhibit a remarkably different self-organization characteristics compared to the QDs grown on (001) surface [cf. Appl. Phys. Lett. 73, 3411 (1998)]. A complex phase separation and strain-relief mechanism are believed to be responsible for the formation of high-density and well-ordered QDs arrays on (311)B surface, but the electronic structure of these QDs is not clearly understood at present. For this purpose, highly-doped Si AFM tips coated with a metal such as Au and Ti were used to measure the current-voltage (I-V) characteristics of QDs with varying sizes, and of any other arbitrary positions on the surface. In the case of QDs on (001) substrate, it was found that local surface potentials of larger QDs were smaller than small QDs possibly due to the effect of surface states. On the other hand, noticeable differences were not observed for QDs on (311)B with various sizes, which suggests that the local surface potential is nearly identical for each QD, and over the whole (311)B surface. Furthermore, a possible resonant tunneling behavior through the quantized energy levels was observed with a small QD with ~ 45 nm in diameter and ~ 4 om in height.
机译:我们使用导电原子力显微镜(AFM)提示来研究通过原子H辅助分子束外延在GaAs(311)B底板上生长的自组织IngaAs量子点(QDS)的电子特性。如前所述,与在(001)表面上生长的QD相比,GaAs(311)B表面上的IngaAs QDS表现出显着的自组织特性[CF.苹果。物理。吧。 73,3411(1998)]。据信复杂的相分离和应变浮雕机构负责在(311)B表面上形成高密度和良好有序的QDS阵列,但目前没有清楚地理解这些QD的电子结构。为此目的,用于涂覆有金属的高掺杂的Si AFM尖端,例如Au和Ti,用于测量具有不同尺寸的QD的电流 - 电压(I-V)特性,以及表面上的任何其他任意位置。在(001)衬底上的QDS的情况下,发现较大QD的局部电位可能由于表面状态的效果而小于小QD。另一方面,对于(311)B为各种尺寸的QDS未观察到明显的差异,这表明局部表面电位对于每个QD几乎相同,并且在整个(311)表面上。此外,通过×45nm的小QD观察到通过量化能量水平的可能谐振隧道行为,其直径为〜45nm,高度为4mm。

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