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Defect levels and inhomogeneities of high purity high resistivity GaAs films grown by vapour phase epitaxy

机译:通过气相外延生长的高纯度高电阻率GaAs膜的缺陷水平和不均匀性

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We investigated by the thermally stimulated currents (TSC) high purity high resistivity GaAs films, grown by vapour phase epitaxy (VPE). To reveal the single levels the thermal emptying of the defects by fractional heating was used. We also investigated the thermally stimulated depolarisation currents (TSD) in samples, which were excited and polarised by light in the presence of an electric field. The following prevailing levels below the conductivity band were found: 0.21 - 0.23, 0.31 - 0.33, 0.35 - 0.38, 0.45 - 0.49 and 0.54 eV. We demonstrate that the TSC and TSD current spectra depend sensitively on the excitation conditions. So light excitation with quantum energy higher than 0.83 eV reveals the level with an activation energy of 0.21 - 0.23 eV, which dominates over the temperature range from about 95 to 200 K. Most probably these defects are located within the VPE layer, and have relatively small effective electron capture and generation coefficients. Moreover, at low temperatures their effective ionisation energy is supposed to increase because of the existence of potential barriers. By contrast, if the quantum energy is 0.5 - 0.83 eV the influence of this level diminishes, and the contribution of donor levels at about 0.13 and 0.17 eV becomes visible. This is evidence of carrier redistribution between different defects. Furthermore, peculiarities of the TSC were observed which could not be explained by a homogeneous semiconductor model. The existence of different polarisation sources in different temperature ranges is demonstrated by TSD. In particular, the inhomogeneous sample polarisation causes the scattering of the activation energy values. Our results prove the influence of the potential relief of the band gap, appearing due to microinhomogeneities of the samples. Furthermore, excitation by 0.5 - 0.83 eV light could lead to the formation of different (p-type) conductivity channels around dislocations through the metastable transformation of the EL2 level.
机译:我们研究了由热刺激电流(TSC)的高纯度高电阻率的GaAs膜,通过汽相外延(VPE)生长。以显示单个水平,使用通过分级加热缺陷的热排空。我们还研究了样品中的热刺激去极化电流(TSD),将其在电场的存在下激发,并且通过偏振光。导电带下方的以下现行水平实测值:0.21 - 0.23,0.31 - 0.33,0.35 - 0.38,0.45 - 0.49和0.54电子伏特。我们证明了TSC和TSD电流谱敏感地依赖于激发条件。与量子能量高于0.83 eV,所以光激发揭示0.21活化能水平 - 0.23电子伏特,其中占主导地位的温度范围内从约95至200 K.最可能的是这些缺陷位于VPE层内,并且具有相对小的有效电子捕获和生成系数。此外,在低温条件下其有效电离能应该增加,因为潜在的障碍存在。相反,如果量子能量为0.5 - 0.83 eV的这个水平减少的影响,和施主能级在约0.13和0.17电子伏特变为可见的贡献。这是不同的缺陷之间的载体再分配的证据。此外,观察到TSC的特殊性无法由均质半导体模型来解释。在不同的温度范围不同的偏振源的存在是由TSD证明。特别地,非均质样品偏振导致的活化能值的散射。我们的研究结果证明的带隙位能的影响,对样品的microinhomogeneities出现所致。此外,激发0.5 - 0.83 eV的光可能会导致通过EL2水平的亚稳态转化形成不同的位错周围(p型)的导电通道。

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