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Shock synthesis of nanocrystalline high-pressure phases in semiconductors by high-velocity thermal spray

机译:高速热喷涂时纳米晶高压相冲击纳米晶高压相

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Shock synthesis of nanocrystalline Si, Ge and CdTe was accomplished using high-velocity thermal spray. Si or Ge powders were injected into a high energy flame, created by a thermal spray gun, where the particles melt and accelerate to impact on a substrate. The shock wave generated by the sudden impact of the droplets propagated through the underlying deposits, which induces a phase transition to a high pressure form. The decompression of the high-pressure phase results in the formation of several metastable phases, as evidenced by transmission electron microscopy and x-ray diffraction studies. The peak pressure is estimated to be ≈ 23GPa with a pulse duration of 1-5 ns. Transmission electron microscopy revealed that the metastable phases of Si with a size range of 2 to 5 nm were dispersed within Si-I. In Ge, a metastable phase, ST- 12, was observed. This is a decompression product of Ge-II which possesses the β-Sn type of structure. In the case of CdTe, a fine dispersion of hexagonal CdTe particles, embedded in cubic-CdTe with an average size of 2 nm was obtained.
机译:使用高速热喷涂完成纳米晶Si,Ge和CdTe的冲击合成。将Si或Ge粉末注入高能量火焰中,由热喷枪产生,其中颗粒熔化并加速到基材上的撞击。由液滴突然撞击通过底层沉积物产生的冲击波,其诱导高压形式的相位过渡。高压相的减压导致形成多个亚稳态相,如透射电子显微镜和X射线衍射研究所证明的。估计峰值压力是≈23GPA,脉冲持续时间为1-5 n。透射电子显微镜表明,尺寸范围为2-5nm的Si的亚稳相分散在Si-1中。在GE中,观察到亚稳态阶段,ST-12。这是GE-II的减压产品,其具有β-Sn结构的结构。在CDTE的情况下,获得嵌入在具有平均尺寸为2nm的立方CdTe中的六边形CdTe颗粒的细分散体。

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