Recently, anodic oxide film formed on niobium, which is more abundant, cheaper, and higher permittivity than that formed on tantalum, has attracted significant attention because of its exploitation in capacitor industry as an alternative material of tantalum capacitor. However, the fewer fundamental aspects of anodic film on niobium are known compared to those of anodic film on aluminum, which is well investigated as a dielectric oxide film. In the present study, the effect of heat treatment and electrolyte temperature on the film structure of anodic films on niobium was investigated by means of voltage-time curves on re-anodizing, measurement of leakage current and capacitance, and dissolution behavior of oxide film to alkaline solution.
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