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Effects of electrolyte pH and temperature on dielectric properties of anodic oxide films formed on niobium

机译:电解质的pH值和温度对铌上形成的阳极氧化膜介电性能的影响

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The effects of electrolyte pH and temperature on the structure and properties of anodic oxide films formed on niobium in phosphoric acid solution with the addition of NH_4OH for pH adjustment have been investigated. The film thickness formed at the same voltage slightly increased with increasing pH and significantly increased with increasing electrolyte temperature. The capacitance of the film was independent of electrolyte pH in an acid region, while it notably increased with increasing pH in an alkaline region. The relative permittivity of the film changed 43.7-80.5 when the electrolyte pH was increased from 1.6 to 10. The incorporation depth and content of phosphorus in the film were markedly suppressed at pH 10, and nitrogen was found to penetrate into a depth of 70%. Furthermore, the apparent transport number of Nb~(5+) ion decreased from 0.26 to 0.02 by a pH increase from 1.6 to 10. The notable changes in structure and dielectric properties of the anodic niobia film formed in the alkaline region would primarily be caused by the different incorporation behavior of electrolyte species such as phosphorous and nitrogen.
机译:研究了电解液的pH值和温度对在铌溶液中添加NH_4OH进行pH调节的铌上形成的阳极氧化膜的结构和性能的影响。在相同电压下形成的膜厚度随pH值的增加而略有增加,并随着电解质温度的增加而显着增加。膜的电容与酸性区域的电解质pH无关,而随着碱性区域pH的增加而明显增加。当电解液的pH从1.6增加到10时,薄膜的相对介电常数变化为43.7-80.5。在pH为10的情况下,薄膜的结合深度和磷含量得到显着抑制,并且发现氮渗透到70%的深度。 。此外,随着pH从1.6增加到10,Nb〜(5+)离子的表观迁移数从0.26减少到0.02。主要是由于在碱性区域形成的阳极氧化铌膜的结构和介电性能发生显着变化。电解质物种(如磷和氮)的不同结合行为。

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