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Ion-implantation Generated Nanovoids in Si and MgO Monitored by High Resolution Positron Beam Analysis

机译:通过高分辨率正电子束分析监测Si和MgO中的离子植入纳米膜

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The formation of Nanovoids in Si(100) and MgO(100) by ~3He ion implantation has been studied. Contrary to Si in which the voids are generally almost spherical, in MgO nearly perfectly rectangular nanosize voids are created. Recently, he 2D-ACAR setup at the Delft Positron Research Center has been coupled to the intense reactor-based variable-energy positron beam POSH. This allows a new method of monitoring thin layers containing Nanovoids or defects by depth-selective high-resolution positron beam analysis. The 2D-ACAR spectra of Si with a buried layer of nanocavities reveal the presence of two additional components, the first related to para-positronium (p-Ps) formation in the nanovoids, and a second one most likely related to unsaturated Si-bonds at the internal surface of the voids. The positronium is present in excited kinetic states with an average energy of 0.3 eV. Refilling of the cavities by means of low dose ~3He implantation (1X10~(14)cm~(-2)) followed by annealing reduces the formation of Ps and the width of the Ps peak in the ACAR spectrum. This width reduction is due to collisions of Ps with He atoms in the voids. In MgO, p-Ps formed with an initial energy of approx 3 eV shows a final average energy of 1.6 eV at annihilation due to collisions with the cavity walls. Possibilities of this new, non-destructive method of monitoring the sizes of cavities and the evolution of nanovoid layers will be discussed.
机译:已经研究了在Si(100)和MgO(100)中形成纳米醇的〜3HE离子注入。与其中空隙通常几乎是球形的Si相反,在MgO中产生几乎是完全矩形的纳米型空隙。最近,Delft正电子研究中心的2D-ACAR设置已经联系在于激烈的基于反应堆的可变能源正电子束缝。这允许通过深度选择性高分辨率正电子束分析来监测包含纳米域或缺陷的薄层的新方法。 Si的2D-Acar光谱具有掩埋层的纳米覆盖物揭示了两种另外的组分的存在,第一个与纳米帽中的阳极(P-PS)形成的第一个有关,以及最可能与不饱和的Si-键相关的第二个相关性在空隙的内表面。正电子以兴奋的动力学状态存在,平均能量为0.3eV。通过低剂量〜3He注入腔(1×10〜(14)cm〜(-2)),然后退火减少了PS和PS峰的宽度在ACAR光谱中的形成。该宽度降低是由于PS的碰撞与空隙中的他原子。在MgO中,具有大约3eV的初始能量形成的P-PS显示由于与腔壁碰撞而导致的1.6eV的最终平均能量为1.6eV。将讨论这种新的,未破坏方法的腔腔尺寸和纳米拓层的演化方法的可能性。

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