首页>
外国专利>
High-resolution detecting defects with positrons recombination by means of simultaneous irradiation of an positron beam and of an electron beam
High-resolution detecting defects with positrons recombination by means of simultaneous irradiation of an positron beam and of an electron beam
展开▼
机译:通过同时照射正电子束和电子束,通过正电子重组来高分辨率检测缺陷
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To inspect the position, number, size and the like of the microflaw in a solid material of every kind inclusive of a semiconductor device or a metal material at a high speed with special resolving power with a nanometer order.;SOLUTION: A converged electron beam device is loaded with a positive electron irradiating function, and flaw position data, converged electron beam position data and the number of flaws or the size of a flaw are obtained from the detection data of γ rays generated by the pair extinction of electrons and positive electrons, and these two-dimensional distribution data are displayed on a monitor.;COPYRIGHT: (C)2005,JPO&NCIPI
展开▼