Physical properties of multiple-energy B-ion implanted C{sub}60 thin films were investigated for various doses. Fourier Transform infra-red Spectroscopy (FTIR) results indicate the structural transformation of C{sub}60 to amorphous carbon phase during implantation. The conductivity type of the implanted films is found to he p-type and the conductivity measurements reveal a dramatic increase in the conductivity with ion implantation. Temperature dependent conductivity shows the semiconducting nature of the B-ion implanted films. The optical absorption coefficient and optical gap of the implanted fits have hem observed as a function of B-ion dose. Measurements on implanted films subjected to thermal annealing indicate the removal of the defects caused during the implantation. Ion implantation-induced defects are found to partially annihilate with the annealing temperature. Electrical conductivity and optical gap are determined in the post-implanted films. The observation of the systematic increase in the conductivity of the annealed films is due to the removal of the defects and the formation of defect flee heron impurity acceptor.
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机译:研究了多能B离子注入的C {Sub} 60薄膜的物理性质。傅里叶变换红外光谱(FTIR)结果表明植入过程中C {亚} 60对非晶态碳阶段的结构转变。植入膜的导电类型被发现对H He P型,并且电导率测量揭示了具有离子注入的导电性的显着增加。温度依赖性电导率显示B离子注入膜的半导体性质。植入配合的光学吸收系数和光学间隙具有作为B离子剂量的函数观察到的下摆。对经受热退火的植入膜的测量表明在植入过程中取出缺陷。发现离子植入诱导的缺陷与退火温度部分湮灭。在植入后的薄膜中确定导电性和光学间隙。对退火薄膜电导率的系统增加的观察是由于去除缺陷和缺陷的形成逃离苍鹭杂质受体。
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