Simulation of a self aligned local oxidation silicon fabrication process for submicron field electron emitters

摘要

The fabrication of a submicron Field Emitters and its arrays using Silicon micro fabrication processes have been reported in the literature and their emission properties have been investigated. Potential applications of Field Emitter Arrays are for Field Emission Displays, high resolution electron beam lithography as well as other applications which require highly collimated electron beams.