首页> 外文会议>Symposium E on thin film materials for large area electronics of the E-MRS 1998 spring conference >Design issues of two-dimensional amorphous silicon position-sensitive detectors
【24h】

Design issues of two-dimensional amorphous silicon position-sensitive detectors

机译:二维非晶硅位置敏感探测器的设计问题

获取原文

摘要

The two-dimensional amorphous silicon position-sensitive detector (PSD) is usually in the form of large-area, continuous p-i-n silicon layer structure coupled with resistive layers next to the p and n Si layers. The device has many applications (e.g. light position measurements, light-pen input devices, etc.) and can be fabricated by using low-cost PECVD process. When used as a light-pen-based input device, several material-related design issues must be critically considered for achieving acceptable performance. The present work addresses three important issues, namely the spectral response of PSD, the uniformity requirement of the resistive layers, and the design of optical filter on the input side of PSD. They correspond to the signal-to-noise ratio of the device, the accuracy of light-position determination, and the integration problem with liquid crystal displays (LCD), respectively. Analytical analysis and computer simulation results draw the following important conclusions: (1) red-light-sensitive PSD can be obtained by properly tuning the thickness of p-layer and i-layer, which suppress the interference of background light when using the input device under sun light or similar illumination (2) the spot size of input light has little effect on position determination, as long as the size does not differ too much from that of required resolution. And a conservative uniformity requirement for the resistive layers can be obtained as |△h/h| ≤ 4/n with n being the required number of pixels of display and h being the film thickness (3) multi-layered filters made of oxides can be deposited on PSD to reflect non-signal light for LCD display while preserving the input-signal when the PSD is placed under a TN LCD.
机译:二维非晶硅位置敏感检测器(PSD)通常是大面积的连续P-I-N硅层结构的形式,其与P和N Si层旁边的电阻层耦合。该设备具有许多应用(例如,光位置测量,轻量笔输入器件等),可以通过使用低成本PECVD工艺来制造。当用作基于浅笔的输入装置时,必须严格考虑多种与材料相关的设计问题以实现可接受的性能。目前的工作解决了三个重要问题,即PSD的光谱响应,电阻层的均匀性要求,以及PSD的输入侧的滤光器的设计。它们对应于设备的信噪比,光位置确定的准确性,以及液晶显示器(LCD)的积分问题。分析分析和计算机仿真结果绘制以下重要结论:(1)通过适当调整P层和I层的厚度可以获得红色光敏PSD,这抑制了使用输入装置时背景灯的干扰在Sun光或类似的照明(2)下,输入光的光斑尺寸对位置测定几乎没有影响,只要尺寸与所需分辨率的尺寸没有太多不同。可以获得对电阻层的保守均匀性要求作为|△H/ h | ≤4/ n具有n所需的显示器数量,H是膜厚度(3)由氧化物制成的多层过滤器可以沉积在PSD上,以反映LCD显示器的非信号灯,同时保留输入信号。当PSD放置在TN LCD下方。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号