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Simulations of electromigration at a tungsten/aluminum junction

机译:钨/铝合金交界处的电迁移模拟

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Finite element solutions to problems of electromigration and stress-driven diffusion are presented. The numerical procedures are based on a formulation that assumes bulk diffusion, so that diffusion along grain boundaries and interfaces is not explicitly taken into account. Two cases are considered: (1) a tungsten via/aluminum line junction, and; (2) a one-dimensional case with a blocking boundary at one end of the line. The results show that lime geometry can significantly affect the magnitude of the stresses that develop, although in each case the maximum hydrostatic stress in the line was proportional to the square root of time.
机译:提出了电迁移问题和应力驱动的扩散问题的有限元解。数值过程基于假设批量扩散的制剂,从而不明确考虑沿晶界和接口的扩散。考虑了两种情况:(1)通过/铝线连接钨,和; (2)一维壳体,其一端具有阻塞边界。结果表明,石灰几何可以显着影响发展的应力的大小,尽管在每种情况下,线路中的最大静水压应力与平方根成比例。

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