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Doping induced internal stress reduction in diamondlike carbon films deposited by pulsed laser ablation

机译:掺杂脉冲激光烧蚀沉积的金刚石碳膜中的诱导内应力降低

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We have investigated the effect of dopants on the reduction of internal compressive stress in diamond-like carbon (DLC) films prepared by pulsed laser deposition on Si(100) substrates. A novel target configuration was used to incorporate dopants into DLC films by sequential pulsed laser ablation of two targets. These dopants include copper, titanium and silicon. The thickness of the DLC films deposited was measured in the range 400nm - 600nm using a profilometer. Raman spectroscopy was employed to analyze the chemistry of the films. The shifts of the G-peak position in the Raman spectrum, due to different concentrations of dopant, were used to estimate the internal stress changes. All of the films showed a Raman spectrum typical of DLC films containing a high fraction of sp~3 species, with the G-peak centered at around 1510-1560cm~(-1). The shift of the G-peak due to the presence of dopants was observed for all the DLC films as compared to the undoped one. It was found that Ti has the strongest tendency to reduce the compressive stress of DLC films. This effect increases with increasing concentration of dopants. Silicon was also observed to have this effect, but the G-peak position did not appear to shift with different Si concentrations. Buckling occurred in the as-deposited, undoped DLC film because of the relief of the large compressive stress accumulated in the film, while all the doped DLC films showed good adhesion to the substrate. The results are discussed combining the atomic structure of DLC and the structure and properties of the dopants.
机译:我们已经调查内部压缩应力的类金刚石碳(DLC)薄膜的脉冲激光沉积在Si(100)衬底上制备的还原掺杂剂的效果。一种新的目标配置使用由两个目标顺序脉冲激光烧蚀掺入掺杂剂引入DLC膜。这些掺杂剂包括铜,钛和硅。沉积在DLC膜的厚度范围为400nm的测定 - 使用轮廓600nm的。拉曼光谱来分析薄膜的化学反应。在拉曼光谱中的G-峰值位置的由于不同浓度的掺杂剂的转移,被用来估计的内应力变化。所有膜的显示的拉曼光谱典型含有SP〜3种物质的高分数DLC膜的,与在围绕1510-1560cm〜了G-峰值为中心(-1)。观察到所有的DLC膜的G峰的由于掺杂剂存在的移位相比,未掺杂的一个。结果发现,Ti具有降低DLC膜的压应力最强的倾向。这种效应随着掺杂浓度的增加而增加。硅还观察到有这种效果,但G-峰值位置没有出现具有不同的Si浓度的转变。屈曲发生在因为在膜中所累积的大的压缩应力的缓解的所沉积的,未掺杂的DLC膜,而所有的掺杂DLC膜显示出良好的对基材的粘合。的结果进行了讨论组合DLC的原子结构的结构和掺杂剂的性质。

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