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Electron emission through tetrahedral amorphous carbon coatings on No and Si emitters

机译:通过无束型无定形碳涂层的电子发射和Si发射器

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The field emission properties of molybdenum and silicon emitter coated with tetrahedral amorphous carbon (or amorphous diamond) were studied. The tetrahedral amorphous carbon was deposited by laser ablation and showed a uniformly coated columnar structure over the entire emitter. In general, current conditioning improved stability and increased the current density. Coatings of ta-C on Mo emitters with and without nitrogen incorporated both yielded significantly higher emissivity than uncoated emitters. Nitrogen incorporation reduced the effective workfunction and the sp~3/sp~2 ratio. However similar depositions on Si emitters reduced the emissivity, and may be attributable to the residual oxide at the ta-C/Si interface. Annealing in a hydrogen atmosphere enhanced emissivity from both ta-C/Mo and ta-C/Si emitters. In general, thick coatings lowered the emissivity and the slope of the I-V curves. A temperature dependence of emission was observed only in the low field regions.
机译:研究了涂有四面体非晶碳(或非无定形金刚石)的钼和硅发射器的场排放性能。通过激光烧蚀沉积四面体非晶碳,并在整个发射器上显示均匀涂覆的柱状结构。通常,电流调节改善稳定性并增加电流密度。在莫发射器上的TA-C涂层,含有氮气的发射器均产生明显较高的发射率,而不是未涂覆的发射器。氮气掺入降低了有效的工作障碍和SP〜3 / SP〜2的比例。然而,类似于Si发射器的沉积降低了发射率,并且可归因于TA-C / Si界面处的残留氧化物。在氢气氛中退火,来自TA-C / MO和TA-C / Si发射器的发射率增强。通常,厚涂层降低了I-V曲线的发射率和斜率。仅在低场区域观察到排放的温度依赖性。

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