Comparative study on effects of Ni ion implantation on amorphous carbon (a-C) coating and tetrahedral amorphous carbon (ta-C) coating

摘要

The effect of Ni ion implantation by 20 keV energy with fluences of 1 × 10~(16) cm~(-2) on tetrahedral amorphous carbon (ta-C) and amorphous carbon (a-C) films was studied. The ta-C and a-C films were deposited using filtered cathodic vacuum arc and high power impulse magnetron sputtering technique, respectively. The morphology, chemical bonding state, and mechanical and tribological performances of the coating before and after implantation were evaluated. The Raman results suggested that Ni implantation resulted in an increase in I_D/I_G ratio of ta-C film from 0.68 to 0.86, but led to a decrease of a-C films from 2.71 to 2.63. Ni ion implantation resulted in a decrease in wear resistance of ta-C films. The as-deposited and Ni-implanted a-C films both occur peeling off in the friction test, but Ni-implanted a-C films showed better wear resistance due to the increased elastic recovery rate and hardness in the modification layer.