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Synthesis of carbon nitride films by arc-heated atomic nitrogen beams assisted pulsed laser ablation

机译:通过弧加热原子氮束辅助脉冲激光烧蚀的合成碳氮化物膜

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Carbon nitride films were synthesized by active atomic nitrogen beams intersecting pulsed laser plumes at the substrates without heating. The properties of the films were studied by Auger electron spectroscopy(AES), X-ray photoelectronspectroscopy(XPS), X-ray diffraction(XRD) and Raman spectroscopy. AES and XPS analysis show that the as-deposited carbon nitride films are mainly composed of [N] and [C], and the composition ratios([N]/[C]) increase as the pulsed laser repetition rate and energy. XRD results show that several diaction peaks attributed toβ-C{sub}3N{sub}4 phase were identified. Raman spectra show that several prominent bands related to C-N bondings could be observed.
机译:通过在基板上交叉在基板上不加热的脉冲激光羽毛的主动原子氮束合成碳氮化物膜。通过螺旋钻电子谱(AES),X射线光电子电极镜(XPS),X射线衍射(XRD)和拉曼光谱研究了薄膜的性质。 AES和XPS分析表明,沉积的碳氮化膜主要由[N]和[C]组成,并且组合物比([N] / [C])随着脉冲激光重复率和能量而增加。 XRD结果表明,鉴定了归因于β-C {Sub} 3N {Sub} 4阶段的几个倒影峰。拉曼光谱表明,可以观察到与C-N键合相关的几个突出条带。

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