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PREPARATION METHOD OF DIAMOND THIN FILM BY ATOMIC HYDROGEN ASSISTED LASER ABLATION

机译:氢原子激光烧蚀制备金刚石薄膜的方法

摘要

The present invention relates to a method of forming a diamond thin film by a laser ablation method. More specifically, in forming a diamond thin film on a substrate by the laser ablation method of the present invention to supply an atomic hydrogen beam (atomic hydrogen beam) on the substrate from the outside to form a high quality diamond thin film It is about.;In the diamond thin film formation method according to the laser ablation method according to the present invention, the laser beam generated from the excimer laser 1 is irradiated to the graphite target 2, and the particles protruding by the laser beam irradiation are subjected to the substrate heater 3. In the diamond thin film formation method by the laser ablation method of depositing a diamond thin film by depositing on a substrate (4) located on the substrate 4, the substrate (4) using a separate atomic hydrogen supply means (5) during the deposition process And further supplying an atomic hydrogen beam onto the bed.
机译:本发明涉及通过激光烧蚀法形成金刚石薄膜的方法。更具体地,在通过本发明的激光烧蚀方法在基板上形成金刚石薄膜以从外部在基板上提供原子氢束(原子氢束)以形成高质量的金刚石薄膜的过程中。 ;在根据本发明的根据激光烧蚀方法的金刚石薄膜形成方法中,将从准分子激光器1产生的激光束照射到石墨靶2上,并且使通过激光束照射而突出的粒子经受激光照射。基板加热器3。在通过激光烧蚀法形成金刚石薄膜的方法中,该方法是通过在位于基板4上的基板(4)上沉积而沉积金刚石薄膜,该基板(4)使用单独的原子氢供给装置(5)。 )在沉积过程中,并进一步将原子氢束供应到床层上。

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