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Diamond thin film formation method by laser ablation combined with high voltage discharge plasma CVD and diamond bulk fabrication method under the conditions of high temperature and high pressure
Diamond thin film formation method by laser ablation combined with high voltage discharge plasma CVD and diamond bulk fabrication method under the conditions of high temperature and high pressure
PURPOSE: A method for manufacturing a diamond thin film and a diamond bulk is provided to synthesize a bulk in a hydrogen gas atmosphere and at a high temperature and a high pressure by using a seed diamond thin film. CONSTITUTION: An ablation phenomenon which is generated when a laser beam(2) generated in a laser(1) is collected by a lens(3) and is irradiated to a high purity graphite is used. A discharging plasma(9) is generated between a graphite cathode(6) and a graphite anode(8). A diamond is formed on a substrate(11) which is positioned on the graphite anode(8) by a high temperature of a central portion of the discharging plasma(9). A hydrogen gas is supplied to a reactor(12).
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