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The Review of Laser Engineering Topical Papers on Thin Films Fabrication and Control. Atomic Layer Growth Control of Thin Films Using Laser Ablation.

机译：薄膜制备和控制激光工程局部纸张综述。使用激光烧蚀的薄膜原子层生长控制。

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作者
Tomoji KAWAI;
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年度 1996
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机译：用薄双层薄膜在水中纳秒激光消融合金化Au / Ag纳米粒子的可控化学计量制备的新方法
2. Layer-by-layer growth of MgO thin films controlled by inserting a TiN seed layer using an in-situ pulsed laser deposition [J] . T.L. CHEN, X.M. LI, W.D. YU, Applied Physics. A, Materials Science & Processing . 2005,第3期

机译：通过使用原位脉冲激光沉积插入TiN种子层来控制MgO薄膜的逐层生长
3. Layer-controlled precise fabrication of ultrathin MoS2 films by atomic layer deposition [J] . Liu Lei, Huang Yazhou, Sha Jingjie, Nanotechnology . 2017,第19期

机译：通过原子层沉积层控制精确制造超薄MOS2膜
4. Nanoscale growth control of functional thin films on atomically surface-controlled substrates by laser MBE [C] . Wakana Hara, Mamoru Yoshimoto Conference on Photon Processing in Microelectronics and Photonics; 20080121-24; San Jose,CA(US) . 2008

机译：激光MBE控制原子受控表面上功能薄膜的纳米级生长
5. Growth and Characterization of Thermoelectric Barium8Gallium16Germanium30 Type-I Clathrate Thin-Films Deposited by Pulsed Dual-Laser Ablation. [D] . Hyde, Robert H. 2011

机译：脉冲双激光烧蚀沉积热电钡8镓16锗30型I笼形薄膜的生长和表征。
6. Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds [O] . Yaowei Wei, Feng Pan, Qinghua Zhang, 2015

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7. Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds [O] . Yaowei Wei, feng pan, Qinghua Zhang, 2016

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8. In situ growth of high quality epitaxial YBa(sub 2)Cu(sub 3)O(sub 7-x) thin films at moderate temperatures by pulsed laser ablation. [R] . Lowndes, D. H., Norton, D. P., McCamy, J. W., 1989

机译：通过脉冲激光烧蚀在中等温度下原位生长高质量外延YBa（sub 2）Cu（sub 3）O（sub 7-x）薄膜。

The Review of Laser Engineering Topical Papers on Thin Films Fabrication and Control. Atomic Layer Growth Control of Thin Films Using Laser Ablation.

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