Deposition of boron-carbon-nitrogen ternary thin films by ion-beam-assisted excimer ablation of B{sub}4C target

摘要

Boron-Carbon-Nitrogen thin films were deposited by laser ablation of B{sub}4C target under nitrogen ion-beam bombardment. The deposited thin films were set for X-ray photoelectron spectroscopy (XPS) and ellipsometry measurements. The resultsshowed that, In the ternary thin films, boron, carbon and nitrogen species were chemically bound to each other instead of simple mixtures. The B-C bonds were broken by the introduced energetic nitrogen ions and, subsequently, C-N and B-N bonds can beformed. The ellipsometry measurement gave the optical band gap of 0.48 eV for the thin films deposited under 50 eV nitrogen ion beam bombardment. According to the analyses, the nitrogen ion beam energy should be lower than 100 eV in most cases.