Rotating target expression electron beam irradiation film forming apparatus and rotating target expression electron beam irradiation auxiliary laser ablation film deposition apparatus

摘要

PROBLEM TO BE SOLVED: To provide a film formation apparatus capable of depositing a thin film of good quality.;SOLUTION: The rotary target type film formation apparatus comprises a target holder 10 that holds a target 11, a rotation mechanism 80 that can rotate the target holder 10, a substrate holder 20 that holds a substrate 21 on which a thin film is to be deposited, an electron beam generation apparatus 30 that generates an electron beam, an electron beam convergence device 40, and a laser beam irradiation apparatus 50. The electron beam convergence device 40 converges an electron beam generated from the electron beam generation apparatus 30 by forming an electron lens focusing the electron beam on the target 11 rotated by the rotation mechanism 80 to thereby liquefy at least a part of the target 11. The laser beam irradiation apparatus 50 performs abrasion by irradiating at least a part of the liquefied target 11 by irradiation with a laser beam.;COPYRIGHT: (C)2007,JPO&INPIT