ELECTRON BEAM AUXILIARY IRRADIATION LASER ABLATION FILM DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a laser ablation film deposition apparatus capable of forming a thin film with a good film quality, by suppressing evaporation of a liquefied material when using an arbitrary solid material and suppressing production of particulates in solid target ablation.;SOLUTION: The electron beam auxiliary irradiation laser ablation film deposition apparatus is equipped with a target holder 10 which holds the target 11, a substrate holder 20 which holds a substrate 21 for film deposition, an electron beam generator 30 which generates an electron beam, an electron beam-converging device 40 and a laser irradiation device 50. The electron beam-converging device 40 forms an electron lens to converge the electron beam generated by the electron beam generator 30 on a part of the surface of the target 11 and locally liquefies the part of the surface. The laser irradiation device 50 irradiates a laser beam onto the part of the surface of the target 11 liquefied by the electron beam-converging device 40 to perform ablation.;COPYRIGHT: (C)2007,JPO&INPIT