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Effects of Irradiation Conditions of Laser Beam on Deposition Rate of LaNiO3 Thin Films at Pulsed Laser Deposition

机译：激光束辐射条件对脉冲激光沉积的LaniO3薄膜沉积速率的影响

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Tomoyuki Fujishima; Hiroyuki Sugita; Takafumi Yuki; Takahiko Yamashita; Hisao Matuo;
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年度 2004
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1. A study of nanostructures of thin films in B-C-N system produced by pulsed laser deposition and nitrogen ion-beam-assisted pulsed laser deposition [J] . S. Bysakh, K. Chattopadhyay, H. Ling Journal of Materials Research . 2004,第3期

机译：脉冲激光沉积和氮离子束辅助脉冲激光沉积产生的B-C-N体系薄膜的纳米结构研究
2. Influence of substrate on structural and transport properties of LaNiO3 thin films prepared by pulsed laser deposition [J] . L. Cichetto Jr., S. Sergeenkov, J. C. C. A. Diaz, AIP Advances . 2017,第2期

机译：衬底对脉冲激光沉积制备的LaNiO3薄膜结构和传输性能的影响
3. Scaling like behaviour of resistivity observed in LaNiO3 thin films grown on SrTiO3 substrate by pulsed laser deposition [J] . Sergeenkov S., Cichetto L. Jr., Zampieri M., Journal of Physics. Condensed Matter . 2015,第48期

机译：通过脉冲激光沉积在SrTiO3衬底上生长的LaNiO3薄膜中观察到的电阻率缩放行为
4. Difference in Deposition Rate and Film Property by Irradiation Conditions of Laser Beam at Pulsed Laser Deposition [C] . Tomoyuki Fujishima, Takahiko Yamashita, Hisao Matsuo International Symposium on High Voltage Engineering; 20050825-29; Beijing(CN) . 2005

机译：脉冲激光沉积条件下激光束辐照条件对沉积速率和膜性能的影响
5. Synthesis of novel materials by pulsed laser deposition and chemical vapor deposition: Part I: Energetic deposition and stability of carbon nitride thin films. Part II: Catalytic growth of one dimensional materials and devices. [D] . Hu, Jiangtao. 2000

机译：通过脉冲激光沉积和化学气相沉积合成新型材料：第一部分：氮化碳薄膜的能量沉积和稳定性。第二部分：一维材料和装置的催化生长。
6. The effect of substrate temperature and oxygen partial pressure on the properties of nanocrystalline copper oxide thin films grown by pulsed laser deposition [O] . Syed Farid Uddin Farhad 2021

机译：衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
7. Influence of substrate on structural and transport properties of LaNiO3 thin films prepared by pulsed laser deposition [O] . L. Cichetto Jr., S. Sergeenkov, J. C. C. A. Diaz, 2017

机译：基板对脉冲激光沉积制备LaNiO3薄膜结构和输运性质的影响
8. Pulsed Laser Deposition of Thin Films for Lasers and Quasi-Phase Matched Devices. [R] . R. W. Eason 2013

机译：用于激光器和准相位匹配器件的薄膜脉冲激光沉积。

Effects of Irradiation Conditions of Laser Beam on Deposition Rate of LaNiO3 Thin Films at Pulsed Laser Deposition

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