^7fLITEF presented the development of the micromachined gyroscope μCORS I at the Symposium Gyro Technology 2001. While μCORS I was designed for an accuracy of 50 °/h, the target accuracy of μCORS II is 5 °/h and better. Thus it complements LITEF's high-precision fiber optic gyro family. Deep Reactive Ion Etching (DRIE) is used as the key technology for the fabrication of the all silicon gyroscope. Electrode gaps of 2.5 μm and a device layer thickness of 50 μm have been realized. First measurements with control loops implemented on a PC as well as on a breadboard electronics have been performed. Over a period of 7 h (at lab conditions with approx. +-1 K temperature variations) a bias error (1 σ) of 5.4 °/h is obtained. Noise measurements yield values of (0.2 - 0.3) °/sqrt(h). Throughout this paper we present the design of the sensitive element, the concept of the sensor system and the results of sensor and sensor system modeling. We further discuss the micromechanical fabrication process and test results gained from the realized prototypes.
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