首页> 外文会议>Solid-state sensor, actuator, and microsystems workshop >A BAROMETRIC PRESSURE SENSOR WITHINTEGRATED REFERENCE PRESSURE CONTROL USING LOCALIZED CVD
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A BAROMETRIC PRESSURE SENSOR WITHINTEGRATED REFERENCE PRESSURE CONTROL USING LOCALIZED CVD

机译:使用局部CVD的气压传感器用沉淀的参考压力控制

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This paper reports a barometric pressure sensor withintegrated reference pressure control. The device was packaged ina cavity, which was created using anodic bonding andsubsequently vacuum sealed using localized CVD (ChemicalVapor Deposition) at near ambient temperature. A post-packagingpressure control system, which consisted of in-cavity pressuremonitoring and pressure control units, was incorporated with thebarometric pressure sensors. The sensor modules, with embeddedcomb resonators and gettering heaters, were fabricated using adouble-polysilicon dissolved-wafer process. The wafers wereanodically bonded, thinned, and then released in EDP. LocalizedCVD was then used to seal the cavity and to react away theresidual gas within it using the getters to create the desiredreference pressure, as measured using the in-cavity resonators.This implementation required very little extra design space, andonly one additional mask compared to the sensor alone. Processimprovements have reduced the sealing time and power by a factorof four compared to that previously reported [1]. Sensors capableof resolving 25mTorr pressure changes with a sensitivity of~60fF/Torr were obtained.
机译:本文报道了气压传感器,其具有沉淀的参考压力控制。该器件被包装在腔体中,使用阳极键合和在近环境温度下使用局部CVD(施胶蒸气沉积)密封的阳极键合的真空。包装后压力控制系统由内腔压力控制单元和压力控制单元组成,与Barometric压力传感器结合在一起。使用嵌入式COMB谐振器和吸收器加热器的传感器模块采用双多晶硅溶解晶片工艺制造。晶片在eDP中脱充,稀释,然后在EDP中释放。然后使用本地化CVD来密封腔并使用吸气器在其内部反应其内的气体,以使用内腔谐振器测量的测量器产生所需的备忘器。此实现需要非常小的额外设计空间,并且与之相比单独传感器。与先前报告的[1]相比,处理过处的处理过程减少了四个因子的密封时间和功率。获得了能够解决25mtorr压力变化的传感器,并获得〜60FF / Torr的灵敏度。

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