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Excitonic recombinations in Cd0.90Mn0.10Te/CdTe heterostructures grown by pulsed-laser evaporation and epitaxy

机译:CD0.90MN0.10.10.10.10mn0.10.10mn0.10的激发重组脉冲蒸发和外延生长

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Cd$-0.90$/Mn$-0.10$/Te/CdTe heterostructures grown on CdZnTe substrates by pulsed laser evaporation and epitaxy have been studied by low temperature photoluminescence. The structures were grown from fluxes of Cd-Te and Cd-Mn-Te resulting from the ablation of solid CdTe and Cd$-1$MIN@x$/Mn$-x$/Te targets with Nd:YAG and excimer XeCl lasers, respectively. The samples chosen for this work are multiple quantum wells (MQW) and superlattices (SL) with buffer and cap layers of various thicknesses and compositions. They have a fixed nominal quantum well width of 2 nm and barriers varying between 4.5 and 16.5 nm, with several combinations of CdTe and Cd$-0.90$/Mn$-0.10$/Te buffer and cap layers.
机译:通过低温光致发光研究了通过脉冲激光蒸发和外延在Cdznte基材上生长的CD $ -0.90 $ / mn $-$ / cdte异质结构。由CD-TE和CD-MN-TE的助熔剂源于固体CDTE和CD $ -1 $ MIN @ X $ / MN $ -X $ / TE目标,从CD-TE和CD-MN-TE的助熔剂生长为ND:YAG和准分子XECL激光器, 分别。选择该工作的样品是多量子孔(MQW)和超晶格(SL),具有各种厚度和组成的缓冲液和帽层。它们具有固定的标称量子孔宽度为2nm,障碍物在4.5和16.5nm之间,CDTE和CD $ -0.90 $ / MN $ -0.10 $ / TE缓冲区和CAP层。

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