首页> 外文会议>International Mechanical Engineering Congress and Exposition >(V010T11A057)Inhibiting the Re-deposition of AuSn_4 on Au/Ni Metallization Pads by Varying the Accessibility of Cu in Isothermally Aged SAC305 Solder Joints
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(V010T11A057)Inhibiting the Re-deposition of AuSn_4 on Au/Ni Metallization Pads by Varying the Accessibility of Cu in Isothermally Aged SAC305 Solder Joints

机译:(v010t11a057)通过改变等温老化的SAC305焊点Cu的可接近性来抑制AUSN_4对AU / Ni金属化垫的再沉积

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Electroplated Ni/Au over Cu is a popular metallization for printed circuit board (PCB) finish as well as for component leads, especially for wire-bondable high frequency packages, w here the gold thickness (> 20 pinches) requirement is high for wire bonding. Redeposition of bulk AuSn_4 intermetallic compound (IMC) at Au/Ni contact pads of isothermally conditioned SnAgCu (SAC) solder joints is a critical reliability concern in these packages because the interfacial layer between rcdeposited AuSa_4 IMC and initially formed IMC during reflow at the contact pad after reflow is brittle in nature. Redeposition of bulk AuSat IMC in Pb-free SAC solder joints (most popularly SAC305) is also believed to be dependent on the degree of access to copper. This study examines the effect of varying gold content (2-5 nominal weight-%) in the solder joint and accessibility to copper (by presence or absence of nickel barrier layer on top of Cu plating) on redeposition of AuSn_4 IMCs at the interface of isothermally aged SAC305 solder joints for 720 hours at 121°C (0.8*T_(melt)). The modified lap shear Iosipescu specimens used for the study are divided into two batches: i] In the first batch, both the copper platens to be soldered are electroplated with Au and Ni. Ni barrier layers are used to completely stop the solder from accessing the Cu in the substrate ii] In the second batch, one Cu platen is electroplated with Au and Ni barrier layer but the other platen is electroplated only with copper (no Nickel layer), to allow accessibility of Cu from the substrate. Representative solder joints from above two batches are then cross-sectioned and analyzed using environmental scanning electron microscopy (ESEM) and energy-dispersive x-ray spectroscopy (EDX) to investigate the composition, thickness and morphology of both bulk and inierfacial IMCs. The first phase to form at the interface of the first batch of specimens after initial reflow is (Ni,Cu)_3Sn_4. During the subsequent solid-state annealing, the redeposition of AuSn_4 occurred in systems plated with Au/Ni on both sides. Contrarily, in the second batch when the solder joint has copper access from one side of the joint, the first intermetallic after reflow to form is (Cu,Ni,Au)_6Sn_5/ (Cu,Au)_6Sn_5 and no redeposition of AuSa_4 is observed after solid state annealing except for the solder joint containing nominal 5wt-% of Au.
机译:电镀镍/金上的Cu是用于印刷电路板(PCB)的涂层以及用于元件引线一种流行的金属化,特别是对引线接合的高频封装中,w这里的金厚度(> 20个箍缩)的要求是高引线接合。在等温条件的SnAgCu(SAC)的金/镍接触垫焊点散装AuSn_4金属间化合物(IMC)的再沉积是因为在接触垫回流期间rcdeposited AuSa_4 IMC和最初形成IMC之间的界面层在这些包的关键可靠性问题回流后在本质上是脆。在无铅SAC焊点(最普遍SAC305)散装AuSat IMC的再沉积也被认为是依赖于访问铜的程度。本研究检查了焊接接头和铜的可用性(在Cu电镀顶部的镍阻挡层的可用性(在Cu电镀顶部的情况下)的影响(Cu NoS的屏障层)的效果等温老年的SAC305焊点在121°C(0.8 * T_(熔体))下为720小时。用于该研究的改性圈剪切IOSIPESCU样本分为两批:I]在第一批次中,待焊接的铜压板两者都用AU和Ni电镀。 Ni屏障层用于完全停止焊料在第二批次中从基板II中取出Cu],用Au和Ni阻挡层电镀一个Cu压板,而另一个压板仅用铜(无镍层)电镀,允许来自基板的Cu的可访问性。从上面两批代表焊点然后横切并使用环境扫描电子显微镜(ESEM)和能量色散X射线光谱(EDX)来调查散装和inierfacial的IMC的组成,厚度和形态分析。第一阶段,以在初始回流后第一批样品的界面的(Ni,Cu)的_3Sn_4。在随后的固态退火期间,在两侧镀的系统中发生了AUSN_4的重新沉积。相反,在第二批时焊点具有从所述接头的一侧铜接入,回流到形式后的第一金属间被(铜,镍,金)_6Sn_5 /(铜,金)_6Sn_5和无AuSa_4的再沉积被观察后,除了含Au的标称5wt-%焊点固态退火。

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