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Fabrication and characterization of p-type SiNW/n-type ZnO heterostructure for optoelectronics application

机译:P型SINW / n型ZnO异质结构的制备与表征光电子应用

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Semiconductor hybrid structure, known as core-shell heterostructures was fabricated and optical properties were analyzed to make it applicable in future optoelectronic and photonic devices. Large-area, high density, vertically oriented silicon nanowire arrays, synthesized by means of metal-assisted chemical etching of p-type silicon (100) substrate was used as the core and zinc oxide (ZnO) layer, deposited on the SiNW arrays by atomic layer deposition (ALD) was used as shell. The XRD peaks of the heterostructure confirmed the subsequent growth of ZnO film on the template of SiNW arrays having similar crystalline quality. The photoluminescence (PL) spectra showed a very sharp peak at 378 nm, corresponding to the band gap of ZnO material and another broad emission band almost throughout the entire visible range with a peak around 550 nm. The structure also showed a very good antireflection property. The results present that the SiNW/ZnO heterostructure can have potential application in future nanoscale electronic and photonic devices.
机译:已知为核 - 壳异质结构的半导体杂化结构,分析光学性质以使其适用于未来的光电和光子器件。通过P型硅(100)基板的金属辅助化学蚀刻合成的大面积,高密度垂直定向的硅纳米线阵列作为芯和氧化锌(ZnO)层,沉积在Sinw阵列上原子层沉积(ALD)用作壳。异质结构的XRD峰证实了具有相似结晶质量的Sinw阵列模板上的ZnO膜的随后生长。光致发光(PL)光谱在378nm处显示出非常尖锐的峰值,对应于ZnO材料的带隙和另一个宽发射带几乎在整个可见范围内,峰值约为550nm。该结构还显示出非常好的抗反射性。结果显示,SINW / ZnO异质结构可以在未来的纳米级电子和光子器件中具有潜在的应用。

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