首页> 外文会议>International Conference on Advanced Engineering and Technology >Boron Compounds Counteracts Oxidative Stress Mediated Genotoxicity Induced By Fe_3O_4 Nanoparticles In Vitro
【24h】

Boron Compounds Counteracts Oxidative Stress Mediated Genotoxicity Induced By Fe_3O_4 Nanoparticles In Vitro

机译:硼化合物在体外抵消Fe_3O_4纳米颗粒诱导的氧化胁迫介导的遗传毒性

获取原文

摘要

Due to rapid growing of nanotechnology, it is currently being used in many areas including biotechnology, electronics, drug delivery systems, cosmetics, material science and biosensors. Oxidative stress is considered as main cause behind the toxicity of nanoparticles (NPs). Recent reports indicate that boron is effective in protecting cells or organisms against oxidative damages by enhancing antioxidant defense mechanisms. However, protective role of boron compounds in nanotoxicity is not investigated yet. Therefore we assessed the potential protective role of boric acid (BA) and borax (BX) against the toxic responses of nano-Fe_3O_4 particles (IO NPs) in cultured human whole blood cells. Our results showed that IO NPs induced genotoxicity in human lymphocytes demonstrated by sister chromatid exchange (SCE) and 8-hydroxy-2'-deoxyguanosine (8-OH-dG) assays. Again, IO NPs caused decreases of total antioxidant capacity (TAC) and decreases of total oxidative stress (TOS) levels in vitro. Co-application of boric acid and borax (2.5 to 10 ppm) into the cell cultures significantly ameliorated genotoxicity and oxidative stress caused by IO NPs. In a conclusion, this study is the first report revealing that BA and BX significantly protected human blood cells from the toxicity of IO NPs, which is mediated through the generation of oxidative stress and depletion of antioxidant capacity.
机译:由于纳米技术快速增长,目前正在许多地区使用,包括生物技术,电子,药物递送系统,化妆品,材料科学和生物传感器。氧化应激被认为是纳米颗粒(NPS)的毒性背后的主要原因。最近的报告表明,通过增强抗氧化防御机制,硼在保护细胞或生物体免受氧化损伤的有效性。然而,尚未研究硼化合物在纳米毒性中的保护作用。因此,我们评估了硼酸(BA)和硼砂(BX)对培养的人类全血细胞中纳米-FE_3O_4颗粒(IO NPS)的毒响应的潜在保护作用。我们的研究结果表明,IO NPS诱导人淋巴细胞的遗传毒性,由姐妹染色体交换(SCE)和8-羟基-2'-脱氧核苷酸(8-OH-DG)测定证明。同样,IO NPS引起总抗氧化能力(TAC)的降低,并在体外降低总氧化应激(TOS)水平。将硼酸和硼砂(2.5至10ppm)共同施加到细胞培养物中显着改善了IO NP引起的遗传毒性和氧化应激。在结论中,本研究表明,第一份报告显示,BA和BX从IO NPS的毒性受到显着保护的人血细胞,这通过产生氧化应激和抗氧化能力的消耗来介导。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号