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Chip to chip bonding using micro-cu bumps with sn capping layers

机译:使用带有Sn封盖层的微型Cu凸块芯片粘接

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The chip to chip bonding technique using a Cu bump capped with thin Sn layers has been frequently applied to 3D chip stacking technology. We studied the effect of the microstructure on the joints. The joints were fabricated by joining micro-Cu bumps capped with Sn-Ag solder with sizes of 10 um × 10 um, 20 um × 20 um, and 30 um × 30 um to Cu pads capped with Sn-Ag solder at 245ºC-330ºC using a thermo compression bonder. Three different types of microstructure were formed in the joints depending on the bonding condition: an Sn-rich phase with Cu6Sn5 in the Cu interfaces, Cu6Sn5 in the interior with Cu3Sn in the Cu interfaces, and one single Cu3Sn phase. The joint with only the Cu3Sn phase had the highest shear strength. Specimens were aged at 150ºC for up to 1000 h. During aging, the microstructures of all the joints became Cu3Sn phase only. The shear strength of the joints was very sensitive to the formation of Cu3Sn and microvoids.
机译:使用Cu Bump盖上用薄SN层的Cu Bump的芯片粘接技术已经经常应用于3D芯片堆叠技术。我们研究了微观结构对关节的影响。通过使用10μm×10μm,20μm×20μm,20μm×20μm的尺寸的Sn-Ag焊料加入SN-Ag焊料的微型Cu凸块,并在245ºC-330ºC下用SN-AG焊料盖上盖子焊盘30μm×30μm使用热压缩粘合剂。接头中形成三种不同类型的微观结构,这取决于粘合条件:Cu界面中的Cu 6 SN 5 中富含SN的相位,CU 6 SN 5 在CU接口中的CU 3 SN,以及一单CU 3 SN相。仅具有Cu 3 SN相的关节具有最高的剪切强度。标本在150℃下老化,高达1000小时。在老化期间,所有关节的微观结构仅为Cu 3 SN阶段。关节的剪切强度对Cu 3 Sn和微毒的形成非常敏感。

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