Hybridization of XRF/XPS and Scatterometry for Cu CMP process control

摘要

This paper demonstrates the synergy between X-rays techniques and scatterometry, and the benefits to combine the data to improve the accuracy and precision for in-line metrology. Particular example is given to show that the hybridization addresses the challenges of aggressive patterning. In 10nm node back-end-of-line (BEOL) integration, we show that the hybridized data between scatterometry and simultaneous X-Ray Fluorescence (XRF) and X-ray Photoelectron Spectroscopy (XPS) provided the closest dimensional correlation to TEM results compared to the individual technique and CDSEM.