Development of an Ion Beam Sputter Deposition System for Producing Complex-Shaped X-ray Mirrors

摘要

We developed a figuring system based on sputter deposition with the aim of establishing a fabrication method for complex-shaped X-ray mirrors. The spatial resolution is essentially determined by the size of the spot profile. In this study, we developed a sputter deposition apparatus using minute pinholes to limit the deposition area, with which deposition spots less than 100 urn in diameter could be produced. Interferometric measurements revealed that surface profiles of the deposition spots were smooth enough to reflect X-rays without scattering.