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THE NATURE OF DISLOCATION LOOPS IN NEUTRON IRRADIATED GALLIUM ARSENIDE

机译:中子辐射镓砷化镓的脱位环的性质

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GaAs is a compound semiconductor material with applications such as semiconductor lasers. The study of irradiation effects in materials has in the past been used to obtain information about point defect migration and coalescence processes in materials. This paper reports on the nature of the dislocation loops in GaAs irradiated with neutrons to a fluence of 2.83×10~(20)n/cm~2 (> 0.82MeV), followed by annealing at 900°C for 20 minutes. As far as we know, the nature of dislocation loops in neutron irradiated GaAs has not been determined and reported yet. The dislocation loops in the irradiated and annealed GaAs were analysed using conventional and high resolution transmission electron microscopy (TEM). The irradiation of GaAs by fast neutrons generates point defects (interstitials and vacancies) which will migrate, coalesce or annihilate during annealing when these point defects become mobile. It has been reported earlier that in GaAs irradiated with 1 MeV electrons, small interstitial dislocation loops on {110} planes became visible after annealing at 500°C. Since these dislocation loops act as preferential sinks for interstitials, the loops will grow in size with increasing annealing temperature. In this investigation the neutron irradiated GaAs was annealed at 900°C in order to create loops large enough for analysis.
机译:GaAs是一种具有诸如半导体激光器的应用的化合物半导体材料。在过去的材料中对材料的辐射效应的研究已被用于获得有关点缺陷迁移和材料聚结过程的信息。本文报告了通过中子照射到2.83×10〜(20)n / cm〜2(> 0.82mev)的流量的GaAs中位错环的性质,然后在900℃下退火20分钟。据我们所知,中子辐照GaAs中位错环的性质尚未确定和报告。使用常规和高分辨率透射电子显微镜(TEM)分析辐照和退火GaAs中的位错环。快速中子的GaAs照射产生点缺陷(间隙和空位),当这些点缺陷变得移动时,会在退火过程中迁移,聚结或湮灭。据报道,在用1个MeV电子照射的GaAs中,在500°C时退火后,{110}飞机上的小型间隙位错循环变得可见。由于这些脱位循环作为间隙的优先汇,因此环的尺寸随着退火温度的增加而增长。在该研究中,中子辐照的GaAs在900℃下退火,以产生足够大的回路以进行分析。

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