This paper is devoted to an integrated piezoresistive pressure sensors based on novel concept of high-temperature microelectromechanical SOI sensors with a monolithic tensoframe. The SOI and integrated MEMS technologies are of especial interest for this sensors. The research enables main technology problems due to the features of a photolithography process on a relief surface with the high aspect ratio and resulted restrictions on the design parameters of SOI sensor three-dimensional micromechanical structures to be defined.
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