Lateral-liquid phase epitaxy of (101) Ge-on-insulator from Si template by metal-induced crystallization

摘要

We investigate metal-induced lateral crystallization (MILC) of Si on insulator to achieve (101) oriented Si films. Moreover, we demonstrate the lateral liquid phase epitaxy of high quality Ge(101) layers by using the MILC-Si films as crystal seed. This technique will be employed to realize high-speed thin-film transistors with Ge channel.