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Design and Fabrication of a SOI Optical Waveguide Sensing Platform for Biochemical Sensor Application

机译:生物化学传感器应用的SOI光波导传感平台的设计与制造

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A micro biochemical sensor based on a SOI optical waveguide sensing platform is reported in this article. The sensing platform utilizes a Mach-Zehnder Interferometer (MZI) configuration. In order to satisfy the single-mode transmission condition of the waveguide and match the coupling size of standard single-mode fiber, a ridge waveguide structure is adopted to construct the MZI configuration. The key parameters of the waveguide are optimized by FDTD method. A process composed of contact exposure photolithography and Inductively Coupled Plasma (ICP) etching technology has been worked out for the fabrication of the optical waveguide sensing platform on SOI wafer. In the process, only one photolithographic mask is used. The mask is designed to have several patterns including an array of MZI configurations for multiple species sensing, a group of ridge waveguides with different key parameters as test references, and a group of geometric compensation schemes to test the methods of modifying the deviation which may arise during the ICP etching step. Process simulations are conducted to predict the exposure and etching results, which give strong support to the fabrication process control. Lithography problems including photoresist desquamation and line narrowing are solved to achieve the special structure.
机译:本文报道了一种基于SOI光波导传感平台的微生物化学传感器。传感平台利用Mach-Zehnder干涉仪(MZI)配置。为了满足波导的单模传输条件并匹配标准单模光纤的耦合尺寸,采用脊波导结构来构建MZI配置。波导的关键参数通过FDTD方法优化。已经制定了由接触曝光光刻和电感耦合等离子体(ICP)蚀刻技术组成的过程用于制造SOI晶片上的光波导传感平台。在该过程中,仅使用一个光刻掩模。掩模旨在具有多种模式,包括用于多种物种感测的MZI配置阵列,这是一组具有不同关键参数的脊波导作为测试参考,以及一组几何补偿方案,以测试修改可能出现的偏差的方法在ICP蚀刻步骤中。进行过程模拟以预测曝光和蚀刻结果,这给了对制造过程控制的强烈支持。解决了包括光致抗蚀剂脱落和线缩小的光刻问题,以实现特殊结构。

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