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Characterization and Photoresponse Propreties of Sn-doped ZnO Thin Films

机译:SN掺杂ZnO薄膜的表征和光响应性质

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Sn-doped ZnO (SZO) thin films were prepared by sol-gel spin-coating method based on zinc acetate dihydrate (CH3COO)2 Zn·2H2O, Tin (IV) chloride pentahydrate (SnCl45H2O), 2-methoxyethanol (C3H8O2) and diethanolamine ((HOCH2CH2)2NH, DEA.The solution was prepared with various Sn doping content in ZnO assigned at 2%, 4%, 6%, 8% and 10%. All fikns were spin-coated on borosilicate substrates and annealed temperature at 550°C for 4 h in air. The structural properties of the films were characterized by XRD and SEM and the corresponding results indicated the crystalline structure and surface morphology of the films, respectively. UV-VIS transmission spectra was used to determine optical properties of as-prepared. The increasing Sn doping content into ZnO films results to the enhancemenl in transparency of the films and the observable alternation in their grain size. The photoilluminated current linearly increases with increasing bias voltage indicating the good Ohmic contact of the device. The photoresponse of the device has significant improvement with increasing Sn doping content.
机译:锡掺杂的ZnO(SZO)通过基于乙酸锌二水合物(CH 3 COO)2的Zn·2H2O,氯化锡五水合物(SnCl45H2O),2-甲氧基乙醇(C3H8O2)和二乙醇胺的溶胶 - 凝胶旋涂法制备薄膜((HOCH 2 CH 2)2 NH,DEA.The溶液用2%,4%,6%,8%和10%分配在不同的ZnO掺杂Sn的含量制备。所有fikns分别旋涂在硼硅酸盐衬底,并在550退火温度℃下在空气中4小时。该膜的结构特性,通过XRD和SEM表征和相应的结果分别表示的薄膜的晶体结构和表面形态。UV-VIS透射光谱被用来确定的光学性能-prepared。日益Sn的掺杂量为ZnO薄膜结果向enhancemenl在膜和在其颗粒尺寸可观察到的交替。随着偏置电压指示装置的良好的欧姆接触的photoilluminated电流线性增加的透明度。该该器件的光响应具有随掺杂了Sn含量显著的改善。

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