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N-Channel Complementary Pairing in Nitride Trap Memory

机译:N沟道互补配对在氮化物陷阱记忆中

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Providing sufficient VT window is a key challenge to scaling non-volatile memories. Nitride trap memories, like the Twin MONOS device [1] shown in Fig. 1, have a simple process, and higher coupling ratios and lower program and erase voltages than conventional floating gate. However nitride trap memory suffers from VT window closure after cycling and retention due to mismatch recombination and surface state traps. Endurance capability can be improved by implementing block-level reference circuits that use actual memory cells to match cycling conditions to improve endurance capability [2].
机译:提供足够的VT窗口是对缩放非易失性存储器的关键挑战。氮化物阱存储器,如图2所示的双单体装置[1]。如图1所示,具有简单的过程,更高的耦合比和更低的程序和擦除电压而不是传统的浮栅。然而,氮化物陷阱记忆仍然受到循环后的VT窗口闭合,并且由于不匹配重组和表面状态捕集器而保持。通过实现使用实际存储器单元来匹配循环条件来提高耐久性能力的块级参考电路可以提高耐力能力[2]。

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