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DLTS and PR studies of partially relaxed InGaAs/GaAs heterostructures grown by MOVPE

机译:Movpe种植的部分放松Ingaas / Gaas异质结构的DLTS和Pr研究

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The studies of electrical activity of deep electron traps and the optical response of partially-strain relaxed In_xGa_(1-x)As layers (x=5.5%, 7.7% and 8.6%) grown by metalorganic vapour-phase epitaxy (MOVPE) have been performed by means of deep-level transient spectroscopy (DLTS) and photoreflectance (PR). DLTS measurements revealed two electron traps. One of the trap has been attributed to electron states at a-type misfit dislocations. The other trap has been ascribed to the EL2 point defect. The PR spectra at room temperature were measured and analysed. By applying the results of theoretical calculations which include excitonic and strain effects, we were able to estimate the extent of strain relaxation and the values of residual strain in the partially relaxed epitaxial layers.
机译:深电子阱的电活动和部分菌株弛豫的光学响应为由金属有机气相外延(MOVPE)生长的层(x = 5.5%,7.7%和8.6%)已经存在通过深层瞬态光谱(DLT)和光反射(PR)进行。 DLT测量显示了两个电子陷阱。其中一个陷阱已归因于型错入脱位处的电子状态。另一个陷阱已经归因于EL2点缺陷。测量并分析室温下的Pr光谱。通过应用包括激子和应变效应的理论计算结果,我们能够估计部分松弛的外延层中应变弛豫的程度和残留应变的值。

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