首页> 外文会议>International Conference on Thin Film Physics and Applications >Study of High Temperature Piezoelectric Scandium Aluminum Nitride Thin Films
【24h】

Study of High Temperature Piezoelectric Scandium Aluminum Nitride Thin Films

机译:高温压电钪氮化铝薄膜的研究

获取原文

摘要

A1N has weak piezoelectric property (piezoelectric coefficient d_(33)=5.5pCN~(-1)) and a high Curie temperature (>1150°C). By Sc-doping in A1N thin films, it is possible to synthesize Sc_xAl_(1-x)N alloy with high piezoelectric coefficient and high temperature stability. In this study, c-axis oriented A1N thin films have been successfully grown on Si (100) substrates by DC magnetron reactive sputtering method. First-principles calculations are also performed to investigate the structure of Sc_xAl_(1-x)N.
机译:A1N具有弱的压电性能(压电系数D_(33)= 5.5pcn〜(-1))和高居里温度(> 1150°C)。通过在A1N薄膜中掺杂,可以合成具有高压电系数和高温稳定性的SC_AL_(1-x)n合金。在该研究中,通过DC磁控反应溅射法在Si(100)基板上成功地生长了C轴取向的A1N薄膜。还执行第一原理计算以研究SC_AL_(1-x)n的结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号