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Study of High Temperature Piezoelectric Scandium Aluminum Nitride Thin Films

机译:高温压电氮化铝氮化铝薄膜的研究

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A1N has weak piezoelectric property (piezoelectric coefficient d33=5.5pCN~(-1)) and a high Curie temperature (>1150°C).By Sc-doping in A1N thin films, it is possible to synthesize Sc_xAl_(1-x)N alloy with high piezoelectric coefficient and high temperature stability. In this study, c-axis oriented A1N thin films have been successfully grown on Si (100) substrates by DC magnetron reactive sputtering method. First-principles calculations are also performed to investigate the structure of Sc_xAl_(1-x)N.
机译:AlN具有弱的压电特性(压电系数d33 = 5.5pCN〜(-1))和居里温度高(> 1150°C),通过在AlN薄膜中掺杂Sc可以合成Sc_xAl_(1-x)具有高压电系数和高温稳定性的N合金。在这项研究中,已通过直流磁控反应溅射法在cSi(100)衬底上成功生长了c轴取向的AlN薄膜。还进行了第一性原理计算以研究Sc_xAl_(1-x)N的结构。

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