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Defects and leakage current in PbTiO{sub}3 single crystals

机译:PBTIO {Sub} 3单晶中的缺陷和漏电流

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Single crystals of PbTiO{sub}3 (PT) were grown by a self flux method, and effects of lattice defects on the leakage current properties were investigated. While PT crystals annealed in air at 700°Cshowed a leakage current density of the order of 10{sup}(-5) A/cm{sup}2, annealing under a high oxygen partial pressure of 35 MPa increased leakage current density to 10{sup}(-4) A/cm{sup}2. The increase in leakage current by the oxidation treatment provides direct evidence that electron hole is a detrimental carrier for the leakage current property of PT at room temperature. The vacancies of Pb are suggested to act as an electron acceptor for generating electron holes.
机译:PBTIO {Sub} 3(Pt)的单晶进行了自动助焊法生长,并研究了晶格缺陷对漏电流性能的影响。虽然Pt晶体在空气中在空气中退火700°,但漏电流密度为10°(-5)A / cm {sup} 2,在35MPa的高氧分压下的退火增加漏电流密度至10 {sup}( - 4)a / cm {sup} 2。氧化处理漏电流的增加提供了直接证据,即电子孔是在室温下Pt的泄漏电流性能的有害载体。建议PB的空位充当用于产生电子孔的电子受体。

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