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Anti-reflection coating on calcium fluoride substrate using ion-assisted deposition

机译:采用离子辅助沉积对氟化钙基材的抗反射涂层

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The IR AR coating is of great importance in contemporary optics industry, thus in this theme we investigate deposition processes of anti-reflection coatings on calcium fluoride substrate using ion-assisted deposition, including single layer of ZnSYbF_3 and a multilayer coating of AR. These thin films are produced by thermal evaporation using ion-assisted deposition, and with their optical characteristics measured and calculated, we analyzed the influence of ion source parameters on coatings such as anode voltage, anode current, argon flow, and so on. Based on research upon, we finally put forward the appropriate parameters to deposition antireflection coating on calcium fluoride substrate, in which the anode voltage and anode current play important roles in influencing the index of refraction and extinction coefficient of single layer of ZnS and YbF_3 coatings in the infrared wavelength. Moreover, because of the ambient moisture, the anti-reflection coating deposition only work for ZnS and YbF_3, but a Y_2O_3 layer can be added to protect the anti-reflection coating. In the end, we measured the coating with spectrometer and find out its average transmission reached 99.8%, which can satisfy the practical requirement.
机译:IR AR涂层在现代光学行业中具有重要意义,因此在该主题中,我们使用离子辅助沉积研究氟化钙基板上的抗反射涂层的沉积过程,包括单层ZnS Ybf_3和Ar的多层涂层。这些薄膜通过使用离子辅助沉积而通过热蒸发产生,并测量并计算它们的光学特性,我们分析了离子源参数对涂层的影响,例如阳极电压,阳极电流,氩流等。基于研究,我们最终提出了在氟化钙基板上沉积抗反射涂层的适当参数,其中阳极电压和阳极电流在影响单层ZnS和YBF_3涂层的折射率和消光系数中起重要作用红外波长。此外,由于环境水分,抗反射涂层沉积仅适用于ZnS和YBF_3,但可以加入Y_2O_3层以保护抗反射涂层。最后,我们用光谱仪测量涂层,并找出其平均传输达到99.8%,可以满足实际要求。

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