首页> 外文会议>International Conference on Advanced Ceramics and Composites >DIFFUSION BONDING OF SILICON CARBIDE FOR MEMS-LDI APPLICATIONS
【24h】

DIFFUSION BONDING OF SILICON CARBIDE FOR MEMS-LDI APPLICATIONS

机译:MEMS-LDI应用碳化硅的扩散键合

获取原文

摘要

A robust joining approach is critically needed for a Micro-Electro-Mechanical Systems-Lean Direct Injector (MEMS-LDI) application which requires leak free joints with high temperature mechanical capability. Diffusion bonding is well suited for the MEMS-LDI application. Diffusion bonds were fabricated using titanium interlayers between silicon carbide substrates during hot pressing. The interlayers consisted of either alloyed titanium foil or physically vapor deposited (PVD) titanium coatings. Microscopy shows that well adhered, crack free diffusion bonds are formed under optimal conditions. Under less than optimal conditions, microcracks are present in the bond layer due to the formation of intermetallic phases. Electron microprobe analysis was used to identify the reaction formed phases in the diffusion bond. Various compatibility issues among the phases in the interlayer and substrate are discussed. Also, the effects of temperature, pressure, time, silicon carbide substrate type, and type of titanium interlayer and thickness on the microstructure and composition of joints are discussed.
机译:对于微电机械系统 - 贫直接喷射器(MEMS-LDI)应用,鲁棒连接方法是批判性的,这需要具有高温机械能力的无泄漏接头。扩散键合非常适用于MEMS-LDI应用。在热压期间使用碳化硅基材之间的钛夹层制造扩散键。中间层由合金钛箔或物理气相沉积(PVD)钛涂层组成。显微镜表明,在最佳条件下形成良好的粘附,裂缝自由扩散键。在少于最佳条件下,由于金属间相的形成,在粘合层中存在微裂纹。电子微升压分析用于鉴定扩散键中的反应形成的相。讨论了中间层和基板中的相之间的各种相容性问题。而且,讨论了温度,压力,时间,碳化硅衬底类型和钛夹层型和厚度对关节微观结构和组成的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号